WAFERMAP includes a Trend Chart in the SPC Tool. This Trend Chart allows
for statistical analysis of multiple data sets. In addition, it is
useful for comparison and drift analysis of production tools. All files
that are loaded into the SPC tool will be displayed. The user can define
the displayed criterion in the selection area below the chart. The
selections include the numerical values mean, maximum, minimum, standard
deviation, range, high-low variation, and number of sites.
Additionally, WAFERMAP allows for the selection of the measurement value
at one of 5 predefined points on the wafer. These points may be actual
measurement sites, or they can be an interpolated location. This
WAFERMAP option allows for the comparison of the same site for all
loaded wafers (e.g. the site in the center of the wafer).
The user
can also choose the sorting criterion. This criterion can be a numerical
value or some of the non-numerical values (e.g. the "Fab name" or the
"Equipment info" from the wafer remarks). One use of this technique is
to sort the data by tool characteristics.
The upper and lower control
limits (UCL, LCL), and the sigma ranges (±1, ±2, ±3 sigma) are shown as
horizontal lines on the plot if they are located within the plotted
range.
On the right side of the plot area, the statistical analysis
of the displayed value (Special Measure Statistics) is given in the form
of a histogram. If for example, the displayed criterion is the mean,
the histogram will show the distribution of the mean values of all
selected wafers.
Single clicking on any marker of a displayed wafer
brings up the Single Wafer Statistics for this wafer on the left side of
the screen.